Wet Thermal Oxide

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University Silicon Wafer for Production

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25.4mm - 300mm from 200Angstroms to 15um oxide.

 

Buy as few as 5 wafers-at our online store!

 

Wet and Dry Thermal Oxide

Thermal Oxide or Silicon Dioxide (SiO2) is the insulating layer commonly used in semiconductors.

We grow our insulating oxide layer using Wet and Dry Oxide methods.

Wet Oxide is the less expensive of the two options and is grown on both sides of the wafer by default.

Clients how need the wet oxide on just one side of the wafer can request us to back-grind oxide off one side of the wafer. 
This is usually the etched side.

 Dry Oxide is more expensive than wet but you can grow the oxide on just one side of the wafer. This reduces
yield issues with back-grinding the wet oxide off one side of the wafer.