SiNx + Si + SiNx wafer stack with undoped silicon, 4" diameter, 200 µm silicon thickness, 50 nm SiNx thickness on each side, <100> orientation, polished/polished surface, and the highest resistivity possible.
SiNx Wafers We Carry
UniversityWafer supplies SiNx wafers, also known as silicon nitride on silicon wafers, for MEMS, dielectric research, thin-film deposition, microfabrication, sensors, optics, and semiconductor device development. We can quote custom SiNx-coated silicon wafers with LPCVD or PECVD silicon nitride films, custom wafer thickness, orientation, resistivity, and polishing options.
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A researcher requested a quote for the following SiNx wafer stack:
This type of double-side silicon nitride coated wafer is commonly used for MEMS membranes, dielectric isolation, passivation layers, microfluidics, biosensors, optical windows, thin-film stress studies, and advanced semiconductor research.
Reference #271261 for specifications and pricing.
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What Are SiNx Wafers?
SiNx wafers, also known as silicon nitride (Si3N4) coated silicon wafers, are widely used throughout the semiconductor industry as dielectric layers, passivation coatings, diffusion barriers, and MEMS structural materials. Silicon nitride films are commonly deposited using LPCVD (Low-Pressure Chemical Vapor Deposition) or PECVD (Plasma-Enhanced Chemical Vapor Deposition) depending on the application's electrical, mechanical, and thermal requirements.
Silicon nitride offers excellent electrical insulation, chemical resistance, mechanical strength, and thermal stability, making SiNx-coated wafers ideal for microelectronics, sensors, integrated circuits, and advanced research applications.
Applications of SiNx Wafers
- MEMS (Microelectromechanical Systems)
- Semiconductor device fabrication
- Surface passivation layers
- Electrical insulation and dielectric films
- Thin-film deposition research
- Microfluidic and biosensor devices
- Photonic integrated circuits (PICs)
- Microelectronics and IC fabrication
- Solar cells and photovoltaic devices
- Optical coatings and waveguides
Why Use Silicon Nitride (SiNx)?
Compared with silicon dioxide (SiO2), silicon nitride provides superior mechanical durability, lower moisture permeability, and excellent resistance to chemical attack. These properties make SiNx an ideal material for protecting semiconductor devices while maintaining excellent electrical performance.
Silicon nitride also serves as an effective diffusion barrier during semiconductor processing, preventing unwanted dopant migration while protecting underlying structures during oxidation and high-temperature fabrication steps.
Typical SiNx Wafer Specifications
UniversityWafer supplies custom SiNx on silicon wafers for research and production. Typical specifications include:
- Silicon wafer diameters from 2" to 300 mm
- <100> or <111> crystal orientation
- Undoped, P-type, or N-type silicon
- LPCVD or PECVD silicon nitride coatings
- SiNx thicknesses from a few nanometers to several microns
- Single-side polished (SSP) or double-side polished (DSP)
- Custom resistivity and wafer thickness
SiNx Wafers for MEMS and Sensor Research
Researchers frequently use SiNx wafers for pressure sensors, accelerometers, resonators, cantilevers, microfluidic devices, biosensors, and other MEMS structures because silicon nitride combines excellent mechanical strength with outstanding dielectric properties. Thin SiNx membranes are also widely used in electron microscopy, X-ray analysis, and nanopore sensing.
Silicon Nitride for Semiconductor Manufacturing
SiNx films are essential during integrated circuit manufacturing, serving as dielectric isolation layers, oxidation masks, anti-reflective coatings, stress-engineering films, and surface passivation layers. Their compatibility with modern CMOS processing makes silicon nitride one of the most widely used materials in semiconductor fabrication.