MgO Wafers Used in Research
Researchers have used the following MgO Specs.
MgO single crystal substrates Orientation (100), with orientation accuracy <0.5deg Edge are oriented (001) ± 1 deg Size: 10 x 10 mm (+/-0.10mm) Thickness: 0.5 mm (+/-0.05mm) Surface Roughness: Ra < 0.5 nm One side epi-polished
Reference #266223 for pricing.
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What Is Magnesium Oxide Wafers?
What is magnesium oxide? It is a material made of magnesium that is highly transparent, and it is used as a substrate for thin films and single crystals. MgO is also very cost effective, and it is used in a number of applications, such as plasma display panels and high-temperature superconductor thin film coatings. Ultimately, the purpose of magnesium oxide is to serve as a strong, lightweight material that is cheap to produce and a good choice for thin film substrates.
While magnesium oxide is abundant in nature, it does not readily react with other elements. It has six opposite neighbors, which makes it resistant to corrosion. Magnesium oxide has good thermal conductivity and is a semiconductor. This mineral also has a low melting point, and is very resistant to heat and corrosion. In addition, magnesium oxide is transparent to various rays. These are just a few benefits of magnesium oxide wafers.
MgO Substrate Inventory
Below are just some of the MgO single crystal wafers that we carry.
Dia |
Ori |
Thick |
Pol |
Material |
10*10mm |
100 |
0.5+/-0.05mm |
DSP |
MgO |
10*10mm |
100 |
0.2+/-0.05mm |
DSP |
MgO |
10*10mm |
111 |
0.5+/-0.05mm |
DSP |
MgO |
10*10mm |
111 |
0.25+/-0.05mm |
DSP |
MgO |
10*10mm |
110 |
0.5+/-0.05mm |
DSP |
MgO |
50.8+/-0.2mm |
20-Nov |
0.5+/-0.03mm |
DSP |
Al2O3 |
Magnesium Oxide Wafers for Electro-Optic Modulator
A space applications engineer requested the following quote:
We require X or Z-cut LN on SiO2 on silicon substrate to use in application of Electro-Optic Modulator. Please confirm if you can supply LNOI substrate with and without MgO doping. Looking forward for your reply.
I need standard LNOI (Lithium Niobate on Insulator)wafers for Electro-optical application.
Our general requirement is:
- X or Z-cut-LN 300nm,600nm,700nm
- SiO2 2um or 4.7um
- SI 0.525mm
Reference #267314 for specs and pricing.
MgO Substrates for Planarization on a Nanofabbed Device
A PhD candiate requested the following quote:
I'm looking into undoped spin-on glass for planarization on a nanofabbed device. The critical dimension that needs to be filled in is ~100nm. The expected thickness is 100-500nm. As stated on the website it can only be spun on silicon. However, we are looking for spinning it onto single crystal MgO substrate. The material needs to go down to 4K and up to RT. Please let me know which product would work the best.
Please reference # 275446 for specs and pricing.