Super Low Stress Silicon Nitride

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Super Low Stress Nitron on Silicon Wafers

When you need the thickest nitride Super Low Stress Nitride is the nitride to use. We can deposit up to 4 micron of nitride using this method of nitride deposition.

SPECIFICATIONS

  • Thickness range: 50Å – 2µm
  • Thickness tolerance: +/-5%
  • Within wafer uniformity: +/-5% or better
  • Wafer to wafer uniformity: +/-5% or better
  • Sides processed: both
  • Refractive index: 2.30 +/-.05
  • Film stress: <100MPa Tensile Stress
  • Wafer size: 50mm, 100mm, 125mm, 150mm, 200mm
  • Wafer thickness: 100µm – 2,000µm
  • Wafer material: Silicon, Silicon on Insulator, Quartz
  • Temperature: 820C°
  • Gases: Dichlorosilane, Ammonia
  • Equipment: Horizontal vacuum furnac