Stoichiometric Silicon Nitride LPCVD Deposition

university wafer substrates

LPCVD Nitride Film Deposition

LPCVD nitride films deposited on silicon be used to deposit silicon oxynnitride films at pressures of 5-100 Torr at an average temperature of 2,732°F. The same problem arises when using the prior art precursors mentioned above to produce a silicon oxide film with a thickness ratio of 0.3 - 1 mm or a width of less than 1.5 mm.

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Where Can you Buy Silicon Nitride (SiN) Coated Silicon Wafers

Below is just a small example of the Stoichiometric Nitride that we have in stock. Please let us know if you need another spec.

We also have the following SiN Wafers

  • Low Stress LPCVD Nitride
  • Super Low Stress Nitride
  • PECVD Nitride
  • Super Low Stress LPCVD Nitride
  • Targeted Stress LPCVD Nitride




Stoichiometric LPCVD Nitride on Silicon Wafers

We have a large selection of nitride coated silicon wafers.


  • Thickness range: 100Å – 4500Å
  • Sides processed: Both
  • Refractive index: 2.00 +/-.05 @632nm
  • Film stress: >800MPa Tensile Stress
  • Wafer size: 1" -12″inches
  • Temperature: 800C°
  • Gases: Dichlorosilane, Ammonia
  • Equipment: Horizontal vacuum furnace

Stoichiometric Silicon Nitride LPCVD Wafers

What Silicon Nitride Wafer Should I Use to Fabricate Waveguide?


Our lab is planning to fabricate some silicon nitride waveguide. so we need to buy some silicon nitride wafers, which means we need around 150 nm stoichiometric silicon nitride films on thermal oxides silicon wafers. the thermal oxide layer should be at least 1 um  thickness. silicon substrate is flexible. #1385 is good thermal oxide wafer for us.  Do you have the processing service to grow 150 nm LPCVD low stress silicon nitride on #1385? can you please send me a quote? Thanks.


100mm P/B <100> 1-10 ohm-cm 500um SSP Prime Grade with 1um of Oxide and 150 nm LPCVD low stress silicon 
Exw price $97.90 each for 25pcs

ID Diam Type Dopant Orien Res (Ohm-cm) Thick (um) Polish Grade Description
3307 50.8mm P B <100> 0.001-0.005 270um SSP Prime w/ 100nm Stoichiometric LPCVD Nitride
3445 50.8mm P B <100> 0-100 500um DSP Prime w/ 620nm LPCVD Nitride
3446 76.2mm Any Any <111> Any 250um DSP Test w/ 200nm Low Stress Nitride
3480 76.2mm ANY ANY <100> Any 250um DSP Test w/ 200nm Low Stress Nitride
1911 100mm P B <100> 1--10 500um SSP Prime w/ 100nm of Standard LPCVD Nitride
1913 100mm P B <100> 1--10 500um SSP Prime with 300nm of Standard LPCVD Nitride
1922 100mm P B <100> 0.001-0.005 500um SSP Prime with 100nm Super Low Stress LPCVD Nitride
2898 100mm N P <100> 1--10 500um DSP Prime with 100nm Low-Stress LPCVD Nitride
3455 100mm P B <100> 1--10 500 SSP Prime with 500nm Low Stress LPCVD Nitride