125mm Silicon Wafers for Research and Production

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What are Some 125mm Silicon Wafer Applications?

125mm silicon wafers are the most popular size for solar cell manufacturing. Typically, a ten-meter wafer will be enough for a single solar cell. However, larger 125mm silicon-based wafers can be up to five times the size. If you're looking for a larger silicon-based wafer, you may have to find a different supplier. Fortunately, there are companies like UniversityWafer, Inc. that offer both standard and customized sized silicon-based wafers.

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125mm (5 Inch) Silicon Wafers

We have a large selection of 125mm Si wafers in stock and ready to ship. Please fill out the form if you need other specs and quantity.

ID Dia Type Dopant Ori Res (Ohm-cm) Thick (um) Polish Grade Description
2451 125mm N As <111> <0.0035 375um SSP MECH Mechanical Grade. EPI Layer: N/Phos Res: 4.59-5.874ohm.cm 12-16um
2875 125mm N P <100> <0.001 3000um SSP Test 3mm thick
2987 125mm P B <111> 1-20 525-575um SSP Test Sold As-Is
2988 125mm P B <111> 1-20 500-550um SSP Test Sold As-Is

 

ID Material Orient. Diam(mm) Thck(μm) Polish ResΩcm Description
5729 P/B [100] 5" 889 ±13 P/E FZ >1,000 SEMI Prime, 1Flat, Empak cst
5744 P/B [100] 5" 920 ±10 E/E FZ >1,000 Empak cst
D744 P/B [100] 5" 920 ±10 E/E FZ >1,000 Warp measured <8μm, Empak cst
B863 n-type Si:P [100] 5" 400 P/E FZ 7,000-14,300 SEMI Prime, 1Flat, Empak cst, Bow/Warp<20μm
D863 n-type Si:P [100] 5" 400 P/E FZ 7,000-14,300 SEMI Prime, 1Flat, Bow/Warp<20μm
2863 n-type Si:P [100] 5" 350 P/E FZ 5,000-10,000 SEMI Prime, 1Flat, Empak cst, Bow/Warp<20μm
C863 n-type Si:P [100] 5" 350 P/E FZ 5,000-10,000 SEMI Prime, 1Flat, Bow/Warp<20μm, in Empak cassettes of 5 wafers
F083 n-type Si:P [111] ±0.1° 5" 200 ±15 BROKEN FZ >3,000 Broken L/L wafers, in 2 pieces
E962 n-type Si:P [111] 5" 300 ±15 P/E FZ 1,000-3,000 SEMI Prime, in hard cassettes of 8 wafers
S5599 P/B [100] 5" 625 ±15 P/P 16-24 SEMI Prime, Empak cst
S5802 P/B [100] 5" 600 ±10 E/E 2.0-3.5 SEMI, 1Flat, coin roll
S5598 P/B [100] 5" 228 P/P 1-10 SEMI Prime, 1Flat, Empak cst, TTV<5μm
D408 P/B [100] 5" 525 P/E 1-100 Silicon rings. 5" outside diameter and 4" inside diameter to hold 4" wafers
S5601 P/B [100] 5" 625 ±15 P/P 1-100 SEMI Prime, Empak cst
S5594 P/B [100] 5" 990 ±8 P/P 1-25 SEMI Prime, Empak cst, TTV<1μm
9228 P/B [100] 5" 525 P/EOx 0.002-0.004 {0.0031-0.0035} SEMI Prime, 1Flat, Striations-Free, TTV<5μm, Back-Side LTO seal 0.50±0.05μm thick, in Empak cassettes of 7 wafers each
X7135 P/B [100] 5" 710 E/E   RTP, One SEMI Flat, in Open Empak cst
6985 n-type Si:As [100] 5" 625 P/E 0.001-0.007 SEMI TEST, 2Flats, Empak cst
6991 n-type Si:As [100] 5" 625 P/E 0.001-0.007 SEMI TEST, 2Flats, Empak cst
S5597 n-type Si:Sb [100] ±1° 5" 1,200 ±10 P/E 0.001-0.025 SEMI Prime, SEMI notch, TTV<1μm Empak cst
X7134 n-type Si:As [100] 5"   E/E   SEMI, 1Flat, in opened Empak cst
X7167 n-type Si:Sb [100] 5"   E/E   SEMI 2Flats (2nd @135°), in opened Empak cst
B862 n-type Si:Sb [111-3.0°] ±0.5° 5" 625 P/E 0.015-0.020 {0.0152-0.0185} SEMI Prime, 2Flats, Empak cst
X7075 Si:? [???] 5" ? P/E ? SEMI Test, 1Flat, Empak cst
X9050 Si:? [???] 5" ? P/E ? SEMI TEST, 1Flat, Empak cst
X9114 n-type Si:? [100] 5" ? P/EOx ? SEMI TEST, 2Flats (SF @ 180°), Back-side LTO seal, Empak cst
X7153 Si:? [100] 5" ? P/E ? SEMI Test, 1Flat, Empak cst
X9111 n-type Si:? [100] 5" ? P/E ? SEMI Test, 2Flats (2nd @ 180°), Empak cst
D925 n-type Si:As [100] 5" 625 OxP/EOx 0.001-0.007 SEMI Prime, 2Flats, Thermal Oxide 3.5±0.5µm thick, Empak cst

125mm Silicon Wafers and Their Applications

125mm silicon wafers are the most popular size for solar cell manufacturing. Typically, a ten-meter wafer will be enough for a single solar cell. However, larger 125mm silicon-based wafers can be up to five times the size. If you're looking for a larger silicon-based wafer, you may have to find a different supplier. Fortunately, there are companies like UniversityWafer, Inc. that offer both standard and customized sized silicon-based wafers.

The earliest films exhibited large stress gradients, causing delamination. To measure film stress, the wafer curvature is measured before and after deposition. This change is then calculated using a modified Stoney's equation. The prescan curvature of the 125mm silicon-based wafer is measured before the deposition and again on the same path after the deposition. The location of the profilometer probe is determined by the position of the polyimide tape.

The silicon-based wafers used in medical applications are available in different types of orientations, including Czochralski-grown silicon, Float-Zone-grown, intrinsic silicon, and etched silicon. The different types of 125mm silicon wafers enable a wide range of technologies. Tight-tolerance silicon wafers are ideal for Si membranes and sensors, MEMS devices, and air speed measurement. The precision of conductivity control makes these products particularly versatile, and many of the world's leading semiconductor device manufacturers use them.

Increasing the diameter of the silicon wafer increases the efficiency of the fabrication process. The more chips the wafer has, the more chips can be produced in the same number of steps. In the past, increasing the size of silicon-based wafers was based on cost per die. But today, with the cost per die falling by 30-40%, the larger diameters make the process more economical. It also allows more die to be fabricated on one silicon-based 125mm wafer.

Earlier films were prone to stress gradients that led to delamination of the substrate and film. In order to determine the stress of the film, the researchers measured the curvature of the silicon wafer and calculated the stress with a modified Stoney's equation. The curvature is measured before and after the deposition, while the postscan curvature is measured along the same path. A polyimide tape is used for thickness verification and the geometric reference for the profilometer probe.

Achieving higher wafer diameters can lead to greater productivity and increased output. Historically, the diameter of a silicon-wafer has been measured in inches, but today's 'correct' figures are in millimeters. This means that a 300mm silicon-wafer is actually 11.8 inches, not thirty-five centimeters. This is why the smaller diameter of a silicon-wafer is so valuable.

Silicon-wafers have been a key element in the realization of ICs, and therefore, the semiconductor industry has invested heavily in their growth. Before, foundries produced a single inch-sized wafer, the current common wafer size is 300mm, which is more than eleven times larger than a single inch. The company has clearly set its sights on 450mm-sized silicon-wafers.

In addition to 125mm-sized silicon-wafers, 450mm-sized wafers are also available. The difference between the two sizes is significant, and a 450mm-sized wafer will require more than one. Hence, it is important to understand the difference between these two. A 2,500mm-sized semiconductor-wafer is not a standard 12 inch, but it is a smaller version of a 12-inch-sized one.

The Czochralski method is used to grow ingots. The silicon is placed in a quartz crucible and heated at 1420 degrees Celsius. Prime Grade Wafers are available in a variety of diameters. A 125mm-diameter silicon wafer is the perfect size for producing high-volume smart-phones. These are a great size for semiconductor manufacturing, but they should be produced with care.

Compared to 200-mm-wide silicon wafers, 450-mm-wide silicon-wafers are much bigger. These 450-mm-wide wafers are much heavier and require major changes in manufacturing. They are a lot thicker, but can still be handled with a regular hand. These are essentially just a fraction of the size of a normal 125-mm-diameter silicon-wafer.