Silicon Nitride Stochiometric LPCVD for Research & Production

university wafer substrates

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  • PECVD Nitride

  • PECVD Oxide

  • PECVD OxyNitride

  • PECVD Low Stress Nitride

  • PECVD Silicon Carbide

  • PECVD Carbon Doped Oxide

We Have the following Silicon Nitride Services

Stoichiometric LPCVD Nitride

Our Standard nitride film works great as hard mask for KOH etching and can be used as a tool for defining active regions during field oxidation.

Low Stress Nitride

Retains all of the same benefits associated with our standard nitride but can also be used for Membranes, Cantilever Beams and other mechanical structures associated with MEMS devices.

Super Low Stress Nitride

Has been developed for applications that require extremely low film stress. Film Stress can also be customized to meet your unique specifications.

Silicon Nitride has good high temperature strength, creep resistance and oxidation resistance. Silicon Nitride's low thermal expansion coefficient gives good thermal shock resistance. Silicon Nitride is produced in three main types; Reaction Bonded Silicon Nitride (RBSN), Hot Pressed Silicon Nitride (HPSN) and Sintered Silicon Nitride (SSN). We have Silicon Nitride 2" - 12" all specs and quanities.

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Below are just some of the Silicon Nitride Coated Wafers that we have in stock! 

Below are just some of the Silicon Nitride Coated Wafers that we have in stock! 

ID Diam Type Dopant Orien Res (Ohm-cm) Thick (um) Polish Grade Qty 1 Unit 5 Unit 10 Unit 25 Unit Description
1912 100mm P B <100> 0.001-0.005 500um SSP Prime 13 $90.90 $64.90 $54.90 $39.90 with 100nm of Standard LPCVD Nitride
1913 100mm P B <100> 1-10 500um SSP Prime 14 $69.90 $64.90 $54.90 $39.90 with 300nm of Standard LPCVD Nitride
1917 100mm P B <100> 1-10 500um SSP Prime 10   $103.90 $76.90 $55.90 with 100nm of Low Stress LPCVD Nitride
1922 100mm P B <100> 0.001-0.005 500um SSP Prime 1   $120.90 $88.90 $64.90 with 100nm Super Low Stress LPCVD Nitride
3028 100mm P B <100> 1-10 525um SSP Prime 23 $105.48 $81.48 $69.48 $59.88 WITH 2 Layers: 500nm Wet Thermal Oxide, and, 40nm Nitride