Substrates Used to Fabricate Nanoparticles

university wafer substrates

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What Substrate is Used to Fabricate Nanoparticles?

Silicon wafers are commonly used as a substrate for fabricating nanoparticles. Some of the specifications that are used to fabricate nanoparticles on silicon wafers include:

  1. Wafer thickness: The thickness of the silicon wafer can affect the size and shape of the nanoparticles that are formed. A thinner wafer may be used for smaller nanoparticles, while a thicker wafer may be used for larger nanoparticles.

  2. Wafer orientation: The crystal orientation of the silicon wafer can affect the growth of the nanoparticles. For example, using a <100> silicon wafer can result in nanoparticles with a preferred orientation.

  3. Surface quality: The surface quality of the silicon wafer affects the ability of the nanoparticles to adhere to the substrate. A clean, smooth surface will promote better adhesion of the nanoparticles.

  4. Surface chemistry: The surface chemistry of the silicon wafer affects the ability of the nanoparticles to adhere to the substrate. A silicon wafer coated with a thin layer of oxide or nitride can promote better adhesion of the nanoparticles.

  5. Wafer doping: doping the silicon wafer with impurities can affect the electrical and optical properties of the nanoparticles that are formed.

These are some of the common specifications used for fabricating nanoparticles on silicon wafers. However, the specific requirements may vary depending on the application and the type of nanoparticles being fabricated.