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I have an interesting situation I wanted to share regarding the following equipment.
An end user is looking to sell (2) Watkins-Johnson 16CVD-250 APCVD systems. Both were purchased new from the OEM. One system is installed and running, and the other was never put into production and is still crated. The crated system was fully functional and tested at WJ prior to crating. The systems are high-throughput, large-area (400mm x 500mm) SiO2 deposition systems for AMLCD and FED device processing.
The unit that is installed, which is currently fully functional, was modified to run two injectors applying Sn02.
Included with the sale is a list of supporting equipment (injectors/vent assemblies/spare boards/chemical cabinet), as outlined below, which can be used on various WJ tools.
The end user is undergoing a production change at their facility, which is why they are selling the equipment. They were initially looking for ~$100k for the unused system alone, but they would now accept $55k for both systems, along with the spares, for the first party that is prepared to move forward with the purchase, as they would like to make space at their facility. Please see additional details below and inquire for further information.
(Qty: 2) WATKINS-JOHNSON WJ 16CVD250 CVD System, 16"
(3) Injectors: 16"
Vent assemblies
Belt size: 18"
Thickness uniformity:
Within substrate: < ±5°
Substrate to substrate: < ±5°
Refractive index: 1.45 ± 0.02
Wet etch rate: ~500-00 Å/min
Film stress: <2 x 10^6 dynes/cm²
Particles added per cm²: <010. >0.3µm
Dielectric breakdown: >8 MV/cm
Dielectric constant: ~4-4.5
Throughput:
400 x 300 mm: 88+ Plates/hr
370 x 470 mm: 57+ Plates/hr
400 x 500 mm: 53+ Plates/hr
Guaranteed utilization: >80°
Utility requirements: 16CVD-250 / 16CVD-140
Process gases:
Nitrogen: 425 Ipm @ 44-55 PSIG
SiH, Purge / Dilution N2: 28 lpm @ 25-35 PSIG
Silane (100%): 200 sccm @ 25-35 PSIG
Oxygen: 30 lpm @ 25-35 PSIG
(LISTING ID: 9186673)