Optical Silicon Wafers 

Optical grade silicon wafers are high-purity semiconductor substrates designed for infrared transmission, photonics, optical windows, laser systems, MEMS fabrication, and advanced semiconductor research. UniversityWafer supplies double-side polished (DSP) and high-resistivity optical silicon wafers with custom orientations, thicknesses, and transmission specifications for infrared and photonic applications.

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Custom Optical Grade Silicon Wafers

UniversityWafer supplies optical grade silicon wafers for infrared transmission, photonics, optical windows, MEMS fabrication, semiconductor processing, and advanced research applications.

Our optical silicon substrates are available with custom diameters, thicknesses, crystal orientations, resistivity ranges, polishing options, and infrared transmission specifications for both university research and semiconductor production environments.

Optical Silicon Research Request Example

A scientist requested a quote for custom optical grade silicon wafers with the following specifications:

25mm or 25.4mm diameter silicon wafers
1mm thickness
<111> crystal orientation
Intrinsic optical grade silicon
Resistivity greater than 2000 Ohm·cm

UniversityWafer provided the following optical silicon solution:

25.4mm silicon wafers, 1-inch diameter, undoped high-resistivity silicon, double-side polished (DSP), optical grade, thickness 300±25µm.

Reference #267943 available for pricing inquiries.

High-resistivity optical silicon wafers are commonly used in:

  • Infrared optical systems
  • Silicon photonics
  • Optical windows
  • Laser instrumentation
  • Infrared spectroscopy
  • MEMS fabrication
  • Optical sensors
  • Semiconductor research

Need Custom Optical Silicon Wafers? UniversityWafer can supply DSP optical silicon substrates with custom resistivity, thickness, orientation, and infrared transmission specifications.

Get Your Optical Silicon Quote FAST! Or, Buy Online and Start Researching Today!





Infrared Transmission Requirements for Optical Silicon

A university researcher requested optical grade silicon wafers for infrared transmission applications with the following specifications:

Monocrystalline optical grade silicon
N-type and/or P-type substrates
Transmission >52% from 2.5µm to 5.0µm
Purity greater than 99.999%
Double-side polished surfaces
Scratch/Dig 40/20
4-inch wafer diameter
1mm thickness

UniversityWafer quoted SEMI Prime optical silicon wafers with:

  • 4-inch diameter DSP silicon wafers
  • N-type Si:P [100] ±0.5° orientation
  • Resistivity 10–50 Ohm·cm
  • TTV <10µm
  • Bow <40µm
  • Warp <40µm
  • Both-side epi-ready polished surfaces
  • SEMI standard flats

These optical silicon wafers met the required infrared transmission specification of >52% transmission between 2.5µm and 5.0µm wavelengths.

Reference #212418 available for pricing and specifications.

Prime Grade and Optical Grade Silicon Wafers

Prime grade silicon wafers are among the highest quality semiconductor substrates available for photonics, infrared optics, semiconductor fabrication, optical windows, sensors, and advanced research applications.

Optical grade silicon wafers are manufactured with extremely low defect densities, excellent surface quality, high purity levels, and superior infrared transmission properties. These polished silicon substrates are commonly used in infrared optical systems, photonic devices, optical filters, laser systems, and semiconductor instrumentation.

Optical grade silicon wafer used for infrared transmission and photonics applications

How Optical Grade Silicon Wafers Are Manufactured

Optical silicon wafers are commonly produced using high-purity crystalline silicon and advanced semiconductor polishing techniques to achieve exceptional surface quality and optical transmission performance.

Many optical silicon substrates are manufactured using ultra-pure fused silica processing methods designed to reduce metallic impurities and improve optical clarity across infrared and ultraviolet wavelengths.

These silicon wafers are typically available with:

  • Single-side polished (SSP) surfaces
  • Double-side polished (DSP) surfaces
  • High resistivity substrates
  • Prime grade semiconductor specifications
  • Custom orientations including <100> and <111>
  • Low Total Thickness Variation (TTV)

Because of their excellent polishing quality and purity, optical grade silicon wafers are widely used in semiconductor research, MEMS fabrication, and infrared optical systems.

Infrared Transmission Properties of Optical Silicon

Optical grade silicon wafers are widely used for infrared transmission applications because silicon exhibits strong transmission properties across important infrared wavelength ranges.

Many high-resistivity silicon wafers provide excellent transmission between approximately 1.2µm and 7µm, making them useful for:

  • Infrared optical windows
  • Thermal imaging systems
  • Infrared spectroscopy
  • Photonic devices
  • Laser optics
  • Optical filters
  • Infrared sensors

Float-zone (FZ) silicon is often preferred for advanced optical applications because it contains lower oxygen concentrations and improved infrared transmission compared to standard Czochralski-grown silicon.

Optical Grade Silicon for Photonics and Semiconductor Research

Optical silicon substrates are widely used in photonics and semiconductor research because of their low defect density, high purity, smooth polished surfaces, and compatibility with semiconductor processing technologies.

Researchers commonly request:

  • Double-side polished silicon wafers
  • High resistivity silicon substrates
  • Intrinsic silicon wafers
  • Infrared optical silicon
  • Epi-ready polished wafers
  • Optical grade DSP silicon

These substrates are frequently used for:

  • Silicon photonics
  • MEMS fabrication
  • Optical sensors
  • Infrared detector systems
  • Projection optics
  • Laser systems
  • Semiconductor metrology

Phonon Absorption in Optical Silicon Wafers

Optical grade silicon wafers exhibit characteristic phonon absorption peaks that influence infrared transmission performance. These absorption peaks vary depending on temperature, crystal growth method, oxygen concentration, and wafer purity.

High-purity optical silicon wafers are engineered to minimize unwanted absorption behavior and maximize transmission performance for infrared optics and photonic applications.

Researchers evaluating optical silicon transmission commonly analyze:

  • Phonon absorption peaks
  • Infrared transmission spectra
  • Temperature-dependent absorption behavior
  • Wafer emissivity
  • Optical reflectivity

Optical Grade Silicon Wafers for Optical Windows and Filters

Optical silicon wafers are commonly used as substrates for optical windows, beam splitters, infrared filters, and protective optical barriers because of their excellent infrared transparency and semiconductor-grade surface quality.

Custom optical windows may include:

  • Anti-reflection coatings
  • Broadband optical coatings
  • Precision optical polishing
  • Custom diameters and thicknesses
  • High surface flatness
  • Scratch/dig optical specifications

Silicon optical windows are commonly integrated into infrared cameras, spectroscopy systems, laser instrumentation, and semiconductor processing equipment.

Why Researchers Use Optical Silicon Wafers

Optical grade silicon combines semiconductor compatibility with excellent infrared optical performance, making it one of the most important substrate materials used in photonics and infrared technology.

Advantages include:

  • High infrared transmission
  • Excellent semiconductor purity
  • Low defect density
  • Superior surface polish quality
  • Compatibility with semiconductor fabrication
  • Excellent thermal stability
  • Availability in DSP and SSP configurations

Because of these properties, optical silicon wafers are used throughout semiconductor manufacturing, photonics research, MEMS fabrication, and infrared optical engineering.

Custom Optical Silicon Wafer Specifications

UniversityWafer supplies custom optical grade silicon wafers with high resistivity, DSP polishing, custom orientations, infrared transmission specifications, and semiconductor-grade surface quality for research and production applications.

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