Substrates Used for Waveguide Development 

Waveguide substrates are critical components in silicon photonics, optical communications, and integrated photonic circuits. UniversityWafer, Inc. supplies SOI wafers, thermal oxide silicon wafers, fused silica, undoped silicon, and silicon dioxide substrates for silica waveguides, polymeric waveguides, telecom wavelength devices, and photonic integrated circuits. Our research-grade substrates are used by universities, national laboratories, and industrial R&D groups for optical sensors, fiber optics, and integrated optics applications.

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Silicon Dioxide Wafers for Silica Waveguide Fabrication

A graduate student in optoelectronics requested custom silicon oxide substrates for the fabrication of silica waveguides. Flame Hydrolysis Deposition (FHD) oxide films are widely used in integrated optics because they provide low optical loss and excellent refractive index control.

We are interested in Flame Hydrolysis Deposition (FHD) silicon oxide wafers doped with germanium, boron, or phosphorus for fabricating silica waveguides. Our preferred wafer size is 3 inches with a 2 µm oxide thickness.

Reference #354-0923 for specifications and pricing.

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SOI Wafers for 1500 nm Telecommunications Waveguides

Silicon-on-insulator (SOI) wafers are among the most popular substrates used for silicon photonics and optical communication devices operating near 1500 nm. Thin silicon device layers provide strong optical confinement and are ideal for fabricating single-mode waveguides and photonic integrated circuits.

A telecommunications engineer requested SOI wafers with:

  • Top silicon thickness between 200 and 300 nm
  • Buried oxide thickness between 2 and 3 µm
  • Wafer diameters up to 150 mm

These substrates were intended for lithography and waveguide fabrication in the telecommunications wavelength regime around 1.5 µm.

Reference #118170 for specifications and pricing.

Thin Intrinsic Silicon Wafers for Waveguide Devices

Double-side polished intrinsic silicon wafers are frequently used for optical waveguides because of their flat surfaces, low defect density, and compatibility with MEMS and photonic processing. Researchers often prefer undoped silicon for minimizing optical losses and improving device performance.

A doctoral researcher requested 125 µm double-side polished intrinsic silicon wafers to fabricate optical waveguides. Larger substrate sizes were preferred, with emphasis on surface flatness and crystal quality.

Reference #121134 for specifications and pricing.

Thermal Oxide for Polymeric Waveguides

Thermal oxide layers are commonly used as undercladding materials in polymeric waveguide devices. Thick oxide layers provide excellent optical isolation and low propagation loss for integrated optics applications.

A physics researcher requested a 2-inch thermal oxide wafer with the thickest possible oxide layer for use as an undercladding material in polymeric waveguide fabrication.

Reference #201960 for specifications and pricing.

Undoped Silicon Wafers for Optical Waveguides

Intrinsic silicon wafers with thermal oxide layers are widely used as substrates for optical waveguides, integrated photonics, and fiber optic devices. Single-side polished wafers with thick SiO2 layers provide excellent optical performance and process compatibility.

A Ph.D. student studying fiber optics and photonics requested:

  • Intrinsic (undoped) silicon
  • 100 mm diameter
  • Thickness greater than 300 µm
  • Thermal oxide thickness greater than 2 µm
  • Single-side polished surface
  • Five wafers for optical waveguide fabrication

Reference #212466 for specifications and pricing.

Common Materials Used in Waveguide Development

  • Silicon-on-Insulator (SOI) Wafers
  • Thermal Oxide Silicon Wafers
  • Fused Silica Wafers
  • Undoped Silicon Wafers
  • Silicon Dioxide (SiO2) Substrates
  • Lithium Niobate Wafers
  • Gallium Arsenide (GaAs) Wafers
  • Polymer Waveguide Materials
  • Photonic Integrated Circuit Substrates
  • Fiber Optic and Telecom Components

What Substrates Are Commonly Used for Waveguide Fabrication?

Waveguides are fundamental building blocks of integrated photonics and optical communication systems. The choice of substrate affects propagation loss, refractive index, thermal stability, and compatibility with fabrication processes. Researchers commonly select substrates based on operating wavelength, optical performance, and device requirements.

substrates used for planar optical waveguides

Silicon Dioxide (SiO2) for Optical Waveguides

Silicon dioxide (SiO2) is one of the most widely used materials for optical waveguides because of its low optical loss and excellent transparency at telecommunications wavelengths. Thermal oxide and silica layers are frequently used in fiber optics, integrated optics, and planar lightwave circuits.

A graduate student in applied physics requested pure silicon wafers with optional 1–2 µm oxide layers for micromachined optical waveguides.

Reference #91283 for specifications and pricing.

Silicon Waveguides for Integrated Photonics

Silicon wafers are widely used in silicon photonics because they are compatible with standard semiconductor manufacturing techniques. Silicon waveguides enable high-density integration of optical devices and are commonly used in optical communications, sensors, modulators, and photonic integrated circuits.

Gallium Arsenide (GaAs) Waveguides

Gallium arsenide (GaAs) is used in laser diodes, microwave photonics, and high-speed optical devices. GaAs waveguides provide excellent electro-optic properties and are commonly employed in active photonic systems.

Lithium Niobate Waveguides

Lithium niobate (LiNbO3) offers exceptional electro-optic and nonlinear optical properties. Lithium niobate waveguides are widely used in optical modulators, frequency converters, quantum optics, and telecommunications devices.

Polymer Waveguides

Polymeric materials are increasingly used for low-cost optical interconnects, flexible electronics, and biosensors. Polymer waveguides are attractive because they are lightweight, inexpensive, and compatible with large-area manufacturing techniques.

Fused Silica for Deep UV and Optical Waveguides

Fused silica wafers provide excellent UV transmission, low birefringence, and low optical absorption. These properties make fused silica ideal for deep-UV waveguides, optical sensors, and low-loss photonic devices.

A Ph.D. student requested fused silica wafers for deep ultraviolet waveguide applications and requested UV transmittance information and thinner substrate options.

Reference #118213 for specifications and pricing.

Fused Silica Specifications for Optical Waveguide Devices

Waveguide researchers often require detailed optical and mechanical specifications including refractive index, surface flatness, birefringence, and dispersion curves. Typical fused silica substrates provide refractive indices near 1.445 at 1550 nm and excellent optical uniformity.

6-inch fused silica wafer, 1 mm thick, single-side polished, low birefringence, refractive index of 1.445 at 1550 nm.

Reference #118665 for specifications and pricing.

SOI Wafers for Silicon Photonics

Silicon-on-insulator (SOI) wafers are among the most popular substrates for waveguide fabrication. Thin silicon device layers combined with buried oxide layers provide excellent optical confinement and are widely used in silicon photonics, modulators, and integrated optical circuits.

A university researcher requested SIMOX SOI wafers with top silicon thickness greater than 190 nm and buried oxide thickness greater than 375 nm for waveguide structures requiring top silicon uniformity better than 10 nm.

Reference #118910 for specifications and pricing.

Single-Mode Waveguides at 1.5 µm

Single-mode waveguides operating near 1.5 µm are critical components in optical communication systems. SOI wafers with top silicon thicknesses between 200 and 300 nm are commonly used to fabricate telecom photonic devices and photonic integrated circuits.

A university engineering laboratory requested SOI substrates to fabricate single-mode waveguides for operation at 1.5 µm with lengths ranging from 3 mm to 10 mm.

Reference #128721 for specifications and pricing.

Graphene Waveguides and Integrated Photonics

Graphene integrated with nitride-coated Corning Eagle glass and silicon photonic waveguides enables advanced modulators, photodetectors, and optoelectronic devices. Researchers frequently use Raman spectroscopy and optical microscopy to verify graphene quality after transfer onto waveguide structures.

UniversityWafer can transfer monolayer graphene onto waveguide structures with approximately 200 nm step heights. Raman analysis is available for additional quality characterization.

Reference #200370 for specifications and pricing.

Applications of Waveguide Substrates

  • Silicon photonics
  • Optical communications
  • Photonic integrated circuits
  • Telecommunications
  • Deep UV waveguides
  • Integrated optics
  • Optical modulators
  • Quantum optics
  • Fiber optics
  • Sensors and biosensors
  • Graphene photonics
  • Laser systems

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